Executive Summary
- Wafer cleaning process is the elimination of chemical and particle filth without altering or damaging the wafer surface or substrate. The surface of the wafer must be preserved and not affected, so that coarseness, corrosion, or pitting does not negate the results of the wafer scrubbing process.
- The rising adoption of MEMS technology in predictable and modern applications is driving the growth of the semiconductor wafer cleaning equipment market. However, the mounting environmental concerns due to the discharge of hazardous chemicals as well as gases during the wafer cleaning process may impede the growth of the semiconductor wafer cleaning equipment market.
- Furthermore, the growing adoption of silicon-based chips, sensors, and diodes in IoT applications is predicted to create market prospects for the semiconductor wafer cleaning equipment market during the forecast timeframe.
Market Overview
- Wet Chemistry-Based Cleaning Technology segment holds the largest industry share, attributed to the surging number of adoptions of printed electronics across the globe
- Rotary Wafer Etching Systems segment holds the largest industry share, attributed to spurring demand for wafer cleaning equipment and promising a rapid increase in market size.
- Chemical Contamination segment holds the largest industry share. Some of the key factors propelling the growth of the market are demand for micro-electro-mechanical systems, growth in the semiconductor industry, and growing demand for tablets and smartphones
Key Findings
- Asia Pacific accounted for the largest share of the Semiconductor Wafer Cleaning Systems market due to increased adoption of consumer electronic devices. The region saw high demand from Outsourced Semiconductor Assembly and Test (OSAT), driven by consolidation in the wafer cleaning equipment market.
- Wet Chemistry-Based Cleaning Technology segment accounted for a significant revenue share.
- With wet cleaning, the surface impurities can be removed without creating rough surfaces afterward. However, after the solvents have been used, they will have to be disposed of; thus, this method generates waste.